DEPOSITION OF NANOCRYSTALLINE CARBON FILMS
Abstract
The results of deposition and investigation of crystalline carbon films in a MWCVD reactor Cyrannus i6 at pressures 100 to 300 mbar with usage of fixed Ar/ CH4 gas mixture are presented in this work. Deposition was carried out from plasma containing dominating concentration of C2 dimers. The films in the range from microcrystalline diamond to amorphous coatings were deposited without hydrogen in the plasma.
Keywords
кристаллические плёнки алмаза,
MCD,
NCD,
UNCD,
MWCVD,
crystalline diamond films,
MCD,
NCD,
UNCD,
MWCVD
About the Authors
Vitaly Alekseevich Tarala
NCFU
Russian Federation
Russian Federation
Andrey Alekseevich Titarenko
NCFU
Russian Federation
Russian Federation
Igor Valerievich Belashov
NCFU
Russian Federation
Russian Federation
Mikhail Yurievich Shevchenko
NCFU
Russian Federation
Russian Federation
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Review
For citations:
Tarala V.A., Titarenko A.A., Belashov I.V., Shevchenko M.Yu. DEPOSITION OF NANOCRYSTALLINE CARBON FILMS. Newsletter of North-Caucasus Federal University. 2013;(4):55-60. (In Russ.)
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